Electrothermal vaporization-inductively coupled plasma-atomic emission spectrometry for the direct determination of trace amounts of impurities in slurries of silicon carbide-Reference-Cited by-同舟云学术

Electrothermal vaporization-inductively coupled plasma-atomic emission spectrometry for the direct determination of trace amounts of impurities in slurries of silicon carbide

Published:2001-04 Issue:2 Volume:433 Page:255-262
ISSN:0003-2670
Container-title:Analytica Chimica Acta
language:en
Short-container-title:Analytica Chimica Acta

Author:

Tianyou Peng,Gang Chang,Xiaohai Sheng,Zucheng Jiang,Bin Hu

Publisher

Elsevier BV

Subject

Spectroscopy,Environmental Chemistry,Biochemistry,Analytical Chemistry

Reference21 articles.

1. ICP-AES detection of silicon carbide impurities volatilized in a graphite furnace with the use of carbon tetrachloride vapour

2. Analysis of silicon carbide powders with ICP-MS subsequent to sample dissolution without and with matrix removal

3. Multielement characterization of silicon carbide powders by instrumental neutron activation analysis and ICP-atomic emission spectrometry

4. Atomic emission and atomic absorption spectrometric analysis of high-purity powders for the production of ceramics

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