Next generation lithography-Reference-Cited by-同舟云学术

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Next generation lithography

Published:1999 Issue:2 Volume:2 Page:9-12
ISSN:1369-7021
Container-title:Materials Today
language:en
Short-container-title:Materials Today

Author:

Harriott L.R.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference6 articles.

1. The National Technology Roadmap for Semiconductors. Semiconductor Industry Association.

2. X-ray Lithography: Status, Challenges and Outlook for 0.13 mm;Silverman;J. Vac. Sci. Technol. B,1997

3. A Review of Ion Projection Lithography;Melngailis;J. Vac. Sci. Technol. B,1998

4. Extreme Ultraviolet Lithography;Gwyn;J. Vac. Sci. Technol. B.,1998

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of transmon qubits solely from optical lithography on 300 mm wafers;Quantum Science and Technology;2019-03-19

2. Introductory Chapter: The Eminence of Lithography—New Horizons of Next-Generation Lithography;Micro/Nanolithography - A Heuristic Aspect on the Enduring Technology;2018-05-02

3. Patterning Techniques for Metal Organic Frameworks;Advanced Materials;2012-05-29

4. High sensitivity nanocomposite resists for EUV lithography;Microelectronic Engineering;2003-05

5. Nanocomposite resist systems for next generation lithography;Microelectronic Engineering;2002-09

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