Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography
Author:
Funder
Ministry of Education
Ministry of Knowledge and Economy
Publisher
Elsevier BV
Subject
Polymers and Plastics,Materials Chemistry,Organic Chemistry
Reference19 articles.
1. Nanolithography and Nanochemistry: Probe-Related Patterning Techniques and Chemical Modification for Nanometer-Sized Devices
2. Fabrication and Replication of Polymer Integrated Optical Devices Using Electron-Beam Lithography and Soft Lithography
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4. Highly Conducting Patterned Pd Nanowires by Direct-Write Electron Beam Lithography
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1. A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography;Nanotechnology;2024-04-30
2. A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography;ACS Omega;2023-03-21
3. Sulfonium-Functionalized Polystyrene-Based Nonchemically Amplified Resists Enabling Sub-13 nm Nanolithography;ACS Applied Materials & Interfaces;2022-12-29
4. Mesoscale Polymer Surfactants: Photolithographic Production and Localization at Droplet Interfaces;Journal of the American Chemical Society;2022-11-28
5. Patterning at the micro/nano-scale: Polymeric scaffolds for medical diagnostic and cell-surface interaction applications;Colloids and Surfaces B: Biointerfaces;2022-10
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