Modification of poly(styrene) thin films and enhancement of cryogenic plasma etching resistance by ruthenium tetroxide vapor staining

Author:

Vital A.,Vayer M.ORCID,Sinturel C.,Tillocher T.,Lefaucheux P.,Dussart R.,Boufnichel M.ORCID

Funder

S2E2 pole de compétitivité

Publisher

Elsevier BV

Subject

Polymers and Plastics,Materials Chemistry,Organic Chemistry

Reference43 articles.

1. Use of ruthenium tetroxide as a multi-purpose oxidant;Berkowitz;J. Am. Chem. Soc.,1958

2. Ruthenium catalysed oxidations of organic compounds;Gore;Platin. Met. Rev.,1983

3. Ruthenium tetroxide staining of polymers for electron microscopy;Trent;Macromolecules,1983

4. The use of ruthenium in hypochlorite as a stain for polymeric materials;Montezinos;J. Polym. Sci. Polym. Lett.,1985

5. Ruthenium tetroxide as a staining agent for transmission electron microscopy of polyamide-polyether blends and block copolymers;Froehling;J. Polym. Sci.,1987

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