Nanoporous hard etch masks using silicon-containing block copolymer thin films-Reference-Cited by-同舟云学术

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Nanoporous hard etch masks using silicon-containing block copolymer thin films

Published:2011-01 Issue:1 Volume:52 Page:86-90
ISSN:0032-3861
Container-title:Polymer
language:en
Short-container-title:Polymer

Author:

Ku Se Jin,Kim Su Min,Bak Chang Hong,Kim Jin-Baek

Funder

Fundamental R&D Program for Core Technology of Materials

Ministry of Knowledge Economy, Republic of Korea

Korea government (MEST)

Publisher

Elsevier BV

Subject

Polymers and Plastics,Materials Chemistry,Organic Chemistry

Reference33 articles.

1. Directing the self-assembly of block copolymers

2. Patterning with block copolymer thin films

3. Controlling Polymer-Surface Interactions with Random Copolymer Brushes

4. Free surface morphology of block copolymers: 1. Styrene-butadiene diblock copolymers

5. Large-Scale Alignment of ABC Block Copolymer Microdomains via Solvent Vapor Treatment

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3. Fabrication of block copolymer templates by using dually responsive photoresist bottom layers;Reactive and Functional Polymers;2017-09

4. Ultrahigh density sub-10 nm TiO 2 nanosheet arrays with high aspect ratios via the spacer-defined double-patterning process;Polymer;2015-03

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