Effects of anodic layer thickness on overall performance of all-solid-state electrochromic device-Reference-Cited by-同舟云学术

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Effects of anodic layer thickness on overall performance of all-solid-state electrochromic device

Published:2019-11 Issue: Volume:341 Page:115045
ISSN:0167-2738
Container-title:Solid State Ionics
language:en
Short-container-title:Solid State Ionics

Author:

Atak Gamze,Coşkun Özlem Duyar

Funder

Scientific and Technological Research Council of Turkey

Hacettepe University

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Reference47 articles.

1. Oxygen partial pressure effects on the RF sputtered p-type NiO hydrogen gas sensors;Turgut;Appl. Surf. Sci.,2018

2. Effects of substrate temperature on the degradation of RF sputtered NiO properties;Ahmed;Mater. Sci. Semicond. Process.,2017

3. Optimization of sputtering NiOx films for perovskite solar cell applications;Yan;Mater. Res. Bull.,2018

4. Annealing effects of NiO thin films for all-solid-state electrochromic devices;Atak;Solid State Ionics,2017

5. Effect of lithium-ion doping concentration on structural and optical properties of NiO films fabricated by magnetron sputtering;Zhao;Vacuum,2017

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