Diamond chemical vapour deposition using tantalum filaments in H2CH4O2 gas mixtures
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Diamond deposition on cemented carbide by chemical vapour deposition using a tantalum filament
2. Activity of tungsten and rhenium filaments in CH4/H2 and C2H2/H2 mixtures: Importance for diamond CVD
3. Effect of oxygen on filament activity in diamond chemical vapor deposition
4. J. Brückner, T. Mäntylä and J. Levoska, in preparation.
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