Characterization and adhesion strength of diamond films deposited on silicon nitride inserts by d.c. plasma jet chemical vapour deposition-Reference-Cited by-同舟云学术

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Characterization and adhesion strength of diamond films deposited on silicon nitride inserts by d.c. plasma jet chemical vapour deposition

Published:1995-10 Issue:11 Volume:4 Page:1260-1266
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Peng X.L.,Liu H.F.,Gan Z.P.,Li H.Q.,Li H.D.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. Process for preparing a polycrystalline diamond body/silicon carbide substrate composite;Lee;USP 4{16171} 16339,1979

2. Morphologies and adhesion strength of diamond films deposited on WC6%Co cemented carbides with different surface characteristics

3. Adhesion strength of diamond film on cemented carbide insert

4. Investigation of cobalt behaviour during diamond deposition on cemented carbides

5. Improved adhesion of CVD diamond films to steel and WCCo substrates

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1. Diagnosis of Electron, Vibrational and Rotational Temperatures in an Ar/N2Shock Plasma Jet Produced by a Low Pressure DC Cascade Arc Discharge;Plasma Science and Technology;2013-09

2. Tailored Si3N4Ceramic Substrates for CVD Diamond Coating;Surface Engineering;2003-12

3. Low incident angle and classical x-ray diffraction analysis of residual stresses in diamond coated Si3N4;Journal of Applied Physics;2003-11

4. Acoustic emission detection of macro-indentation cracking of diamond coated silicon;Diamond and Related Materials;2003-10

5. Surface Pretreatments of Silicon Nitride for CVD Diamond Deposition;Journal of the American Ceramic Society;2003-05

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