Modeling diamond chemical vapor deposition in a rotating disk reactor-Reference-Cited by-同舟云学术

Modeling diamond chemical vapor deposition in a rotating disk reactor

Published:1996-04 Issue:3-5 Volume:5 Page:221-225
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Kassmann Dean E.,Badgwell Thomas A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. A mathematical model of the fluid mechanics and gas-phase chemistry in a rotating disk chemical vapor deposition reactor;Coltrin;J. Electrochem. Soc.,1989

2. Numerical modelling of the filament-assisted diamond growth environment;Goodwin;J. Appl. Phys.,1990

3. Forced flow near a heated rotating disk: a similarity solution;Evans;Number. Heat. Transfer,1988

4. Analysis of diamond growth in subatmospheric dc plasma-gun reactors;Coltrin;J. Appl. Phys.,1993

5. Spin (version 3.83): a Fortran program for modeling one-dimentional rotating-disk/stagnation-flow chemical vapor deposition reactors;Coltrin;Sandia National Laboratories Rep. SAND 91-8003,1993

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