Author:
Morrison Philip W.,Taweechokesupsin Oranut,Kovach Christopher S.,Roozbehani Behrooz,Angus John C.
Subject
Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials
Reference4 articles.
1. In situ infrared measurements of film and gas properties during the plasma deposition of amorphous hydrogenated silicon
2. fluent Version 4.2, Computer program for modeling fluid flow, heat transfer, and chemical reaction, Fluent, Inc., NH 03766.
3. Chemkin II;Kee;Sandia Report SAND89-8009B,1992
4. P.W. Morrison, Jr., P.R. Solomon and D.G. Hamblen, US Patent 4985858, 1991.
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