Plasma beam deposition of highly tetrahedrally bonded amorphous carbon-Reference-Cited by-同舟云学术

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Plasma beam deposition of highly tetrahedrally bonded amorphous carbon

Published:1994-04 Issue:4-6 Volume:3 Page:608-612
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Weiler M.,Sattel S.,Jung K.,Ehrhardt H.,Veerasamy V.S.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Properties and Characterization of Amorphous Carbon Films,1990

2. Plasma Deposited Thin Films;Angus,1986

3. Diamond and diamond-like phases

4. Optical and electronic properties of amorphous diamond

5. Investigations of the structure of a-C:H films

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structure of Amorphous Carbon;Tetrahedrally Bonded Amorphous Carbon Films I;2018

2. Absolute cross section for forward recoiling hydrogen with 1.0–12.5 MeV 4He;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-11

3. LOW HYDROGEN CONTENT HYDROGENATED AMORPHOUS CARBON FILMS USING DIRECT CURRENT GLOW DISCHARGE PLASMA CVD;International Journal of Modern Physics B;2002-03-20

4. Direct ion beam deposition of hard (>30 GPa) diamond-like films from RF inductively coupled plasma source;Diamond and Related Materials;2001-03

5. Ab initiosimulation of structure in amorphous hydrogenated carbon;Physical Review B;2000-08-01

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