Patterning of CVD diamond films by seeding and their field emission properties

Author:

Katsumata Satoshi,Oobuchi Yoshimichi,Asano Tanemasa

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Microwave-assisted CVD processes for diamond synthesis;Microwaves in Chemistry Applications;2021

2. Fabrication of planarised conductively patterned diamond for bio-applications;Materials Science and Engineering: C;2014-10

3. Fabrication technology for single-material MEMS using polycrystalline diamond;Diamond and Related Materials;2010-10

4. Technology of polycrystalline diamond thin films for microsystems applications;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005

5. Patterning of diamond microstructures on Si substrate by bulk and surface micromachining;Journal of Materials Processing Technology;2003-01

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