Directed self-oriented self-assembly of block copolymers using chemically modified surfaces-Reference-Cited by-同舟云学术

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Directed self-oriented self-assembly of block copolymers using chemically modified surfaces

Published:2015 Issue: Volume: Page:129-170
ISSN:
Container-title:Directed Self-assembly of Block Co-polymers for Nano-manufacturing
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Author:

Seidel R.,Williamson L.,Segal-Peretz T.,Wu G.,Suh H.S.,Zhou C.,Xiong S.,Craig G.S.W.,Nealey P.F.

Publisher

Elsevier

Reference104 articles.

1. Solvent swelling of roll-cast triblock copolymer films;Albalak;Polymer,1998

2. Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device;Albert;Nano Lett.,2011

3. Bit patterned media at 1 tdot/in2 and beyond;Albrecht;IEEE Trans. Magn.,2013

4. Self-consistent theory of block copolymer blends— selective solvent;Banaszak;Macromolecules,1992

5. Block copolymer thermodynamics—theory and experiment;Bates;Annu. Rev. Phys. Chem.,1990

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns;Scientific Reports;2016-08-16

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