THE DIFFUSION-ETCH-MODEL PARTI: PROPOSAL OF A NEW TWO PHASE TRACK DEVELOPING MODEL

Author:

Törber G.,Enge W.,Beaujean R.,Siegmon G.

Publisher

Elsevier

Reference8 articles.

1. Staatsexamensarbeit (Diploma-work);Braune,1981

2. Braune, G., and W. Enge (1981). Improvements of the α-particle registration applying the diffusion etch model (this conference).

3. Grundlagen der physikalischen Chemie;Brdicka;Dtsch. Verlg. d. Wiss., Berlin,1969

4. Milanowski, I., W. Enge, G. Sermund, R. Beaujean and G. Siegmon (1981). The diffusion-etch-model, part II (this conference).

5. Sermund, G., G. Siegmon, W. Enge and R. Beaujean (1979). Proceedings of the 10th SSNTD, Lyon, Pergamon Press, 1071–1077.

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1. Ion-Track Etching;Transport Processes in Ion-Irradiated Polymers;2004

2. Measurement of bulk etch rate of LR115 detector with atomic force microscopy;Radiation Measurements;2002-12

3. Track Etching: Methodology and Geometry;Solid State Nuclear Track Detection;1987

4. Further Applications of Track Detectors and Some Directions for the Future;Solid State Nuclear Track Detection;1987

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