Author:
Maiti C.K.,Samanta S.K.,Chatterjee S.,Dalapati G.K.,Bera L.K.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference104 articles.
1. Applications of silicon–germanium heterostructure devices;Maiti,2001
2. Strained silicon heterostructures: materials and devices;Maiti,2001
3. High-performance strained-SOI CMOS devices using thin film SiGe-on-insulator technology;Mizuno;IEEE Trans. Electron Dev.,2003
4. Kinetics and mechanism of oxidation of SiGe: dry versus wet oxidation;Legoues;Appl. Phys. Lett.,1989
5. Anomalous strain relaxation in SiGe films and superlattices;LeGoues;Phys. Rev. B,1991
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