Author:
Pradeep Krishna,Poiroux Thierry,Scheer Patrick,Juge André,Gouget Gilles,Ghibaudo Gérard
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference39 articles.
1. Managing process variation in intel’s 45 nm CMOS technology;Kuhn;Intel Technol J,2008
2. Device level modeling challenges for circuit design methodology in presence of variability;Juge,2016
3. Characterization methodology for MOSFET local systematic variability in presence of statistical variability;Piliado;J Low Power Electron,2014
4. Simulation of statistical variability in nano MOSFETs;Asenov,2007
5. Grain-orientation induced work function variation in nanoscale metal-gate transistors – Part I: Modeling, analysis, and experimental validation;Dadgour;IEEE Trans Electron Dev,2010
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