Amorphous silicon technology for large area digital X-ray and optical imaging-Reference-Cited by-同舟云学术

Amorphous silicon technology for large area digital X-ray and optical imaging

Published:2002-04 Issue:4-5 Volume:42 Page:735-746
ISSN:0026-2714
Container-title:Microelectronics Reliability
language:en
Short-container-title:Microelectronics Reliability

Author:

Nathan Arokia,Park Byung-kyu,Ma Qinghua,Sazonov Andrei,Rowlands John A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference36 articles.

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4. Physics of a-Si:H switching diodes;van Berkel;J Non-Cryst Solids,1993

5. Amorphous silicon field effect device and possible application;LeComber;Electron Lett,1979

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