Dielectric characterization of ferroelectric thin films deposited on silicon-Reference-Cited by-同舟云学术

Dielectric characterization of ferroelectric thin films deposited on silicon

Published:1999-02 Issue:2 Volume:39 Page:251-256
ISSN:0026-2714
Container-title:Microelectronics Reliability
language:en
Short-container-title:Microelectronics Reliability

Author:

Legrand C.,Haccart T.,Velu G.,Chambonnet D.,Remiens D.,Burgnies L.,Mehri F.,Carru J.C.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference3 articles.

1. Jaber B, Remiens D, Thierry B. Substrate temperature and target composition effects on PbTiO3 thin films produced in situ by sputtering. J Appl Phys 1996;79(2)

2. Chambonnet D, Audry C, Fages-Bonnerry A, Mer C, Fages C, Perriere J. Growth of BST thin films on silicon substrates. Application to integrated capacitors for DC–DC converters. In: European Meeting on Integrated Ferroelectric (EMIF2), 29–30 September, 1997

3. Jaffe B, Cook WR, Jaffe H. Piezoelectric Ceramics. London: Academic, 1971

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