Flash memory reliability

Author:

Cappelletti P

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Cappelletti, P., Panchieri, A. and Ravazzi, L., Mastering key factors which affect Flash memory reliability. In Proc. ESREF'93, Bordeaux, France, 1993

2. Cappelletti, P. and Ghidini, G., Evaluation methods of thin oxide for Flash memories. In Proc. 7th Workshop on Dielectrics in Microelectronics, Crete, Greece, 1995

3. Accelerated current test for fast tunnel oxide evaluation;Cappelletti;Proc. ICMTS'91,1991

4. Cappelletti, P., Bez, R., Cantarelli, D. and Ravazzi, L., CAST: an electrical stress test to monitor single bit failures in Flash–EEPROM structures. In Proc. 12th Workshop on Non Volatile Semiconductor Memory, Monterey, CA, 1994

5. Cappelletti, P., Bez, R., Cantarelli, D. and Fratin, L., Failure mechanisms of Flash cell in program/erase cycling. In Proc. IEDM'94, Digest of Technical Papers, 1994, p. 291

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