In situ stress measurements of sputter-deposited films-Reference-Cited by-同舟云学术

In situ stress measurements of sputter-deposited films

Published:1997-07 Issue:1-3 Volume:62 Page:663-667
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Honda N.,Shoji F.,Kidoguchi S.,Hamada Y.,Nagata M.,Oura K.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Handbook of Thin Film Technology;Campbell,1969

2. Physics of Nonmetallic Thin Films;Hoffman,1974

3. Internal stress in sputtered chromium;Hoffman;Thin Solid Films,1977

4. Internal stress in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering;Thornton;J. Vac. Sci. Technol.,1977

5. Compressive stress and inert gas in Mo films sputtered from a cylindrical-post magnetron with No, At, Kr, and Xe;Hoffman;J. Vac. Sci. Technol.,1980

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