Effect of ion beam energy on the electrical, optical, and structural properties of indium tin oxide thin films prepared by direct metal ion beam deposition technique-Reference-Cited by-同舟云学术

Effect of ion beam energy on the electrical, optical, and structural properties of indium tin oxide thin films prepared by direct metal ion beam deposition technique

Published:2002-04 Issue:1-2 Volume:408 Page:218-222
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kim Daeil,Kim Steven

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Deposition of transparent and conducting indium-tin-oxide films by the r.f.-superimposed DC sputtering technology

2. Investigation of annealing effects on indium tin oxide thin films by electron energy loss spectroscopy

3. Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method

4. Effects of thermal annealing on the indium tin oxide Schottky contacts of n-GaN

5. Indium-doped zinc oxide films as transparent electrodes for solar cells

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