Thin-film tantalum-nitride resistor technology for phosphide-based optoelectronics

Author:

Lovejoy M.L.,Patrizi G.A.,Roger D.J.,Barbour J.C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. An InP-based HBT Fab for high-speed digital, analog, mixed-signal, and optoelectronics ICs;Stanchina,1995

2. Integrated tantalum film RC circuits;Orr,1970

3. The STIC technology—a monolithic approach for combining tantalum and silicon technologies;Bulger;IEEE Trans. Components, Hybrids, Manufact. Technol. (USA),1981

4. Tantalum thin-film RC circuit technology for a universal active filter;Worobey;IEEE Trans. Parts, Hybrids Packaging (USA),1976

5. Determination of the relative nitrogen doping level of tantalum nitride resistor film by means of the Seebeck effect;Trudel;IEEE Trans. Parts, Hybrids, Packaging (USA),1972

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