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Silicon surface processing techniques for micro-systems fabrication

  • Published:2003-08 Issue: Volume:438-439 Page:445-451
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Mizeikis Vygantas,Juodkazis Saulius,Ye Jia-Yu,Rode Andrei,Matsuo Shigeki,Misawa Hiroaki

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Inhibited spontaneous emission in solid-state physics and electronics;Yablonovitch;Phys. Rev. Lett.,1987

2. Photonic Crystals: Molding the Flow of Light;Joannopoulos,1995

3. Fabrication and direct transmission measurement of high aspect ratio two-dimensional silicon-based photonic crystal chips;Xu;J. Opt. Soc. Am. B,2001

4. Transfer matrix techniques for electromagnetic waves;Pendry,1996

5. Fabrication and optical characteristics of silicon-based two-dimensional photonic crystals with honeycomb lattice;Ye;Opt. Commun.,2002
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