Author:
Zuber A.,Kaiser N.,Stehlé J.L.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. Laser induced damage threshold of dielectrics coatings at 193 nm and correlations to optical constants and process parameters;Kolbe;NIST Spec. Publ.,1990
2. Structure of thin fluoride films deposited on amorphous substrates;Kaiser;Thin Solid Films,1992
3. Evaluation of thin MgF2 films by spcctroscopic ellipsometry;Kaiser;Thin Solid Films,1993
4. Very high damage threshold Al2O3SiO2 dielectric coatings for excimer laser;Kaiser,1994
5. Vacuum ultraviolet thin films. 1:Optical constants of BaF2, CaF2, LaF3, MgF2, Al2O3, HfO2, and SiO2 thin films;Zukic;Appl. Opt.,1990
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