Preparation of β-FeSi2 films by chemical vapor deposition-Reference-Cited by-同舟云学术

Preparation of β-FeSi2 films by chemical vapor deposition

Published:2001-01 Issue:2 Volume:381 Page:214-218
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Mukaida Masakazu,Hiyama Isao,Tsunoda Tatsuo,Imai Yoji

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Refractory Transition Metal Compound;Samsonove,1955

2. Mechanism of Electrical Conduction in β-FeSi2

3. Semiconducting and Thermoelectric Properties of Sintered Iron Disilicide

4. Semiconducting silicide-silicon heterostructures: growth, properties and applications

5. K. Matsubara, T. Koyanagi and T. Takagi, Proceedings of the 6th International Conference on Thermoelectric Energy Conversion, IEEE, New York, 1986, pp.1–6.

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