Studies on the formation of microcrystalline silicon with PECVD under low and high working pressure-Reference-Cited by-同舟云学术

Studies on the formation of microcrystalline silicon with PECVD under low and high working pressure

Published:2000-11 Issue:1-2 Volume:376 Page:249-254
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Lihui Guo,Rongming Lin

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Complete microcrystallinep‐i‐nsolar cell—Crystalline or amorphous cell behavior?

2. J. Meier, H. Keppner, S. Dubail, Y. Ziegler, L. Feitknecht, P. Torres, Ch. Hof, U. Kroll, D. Fisher, J. Cuperus, J.A. Anna Selvan, A. Shah, 2nd World Conference on Photovoltaic Solar Energy Conversion, Vienna, Austria, 6–10 July 1998, Proceeding digest.

3. D. Fisher, H. Keppner, U. Kroll, P. Torres, J. Meier, R. Platz, S. Dubail, J.A.A. Selvan, N.P. Vaucher, Y. Ziegler, R. Tscharner, Ch. Hof, N. Back, M. Goetz, P. Pernet, M. Goerlitzer, N. Wyrsch, J. Vuille, J. Cuperus, A. Shah, Proceedings of the 14th European Photovoltaic Solar Energy Conference, Barcelona, Spain, 1997, p. 2347.

4. Plasma and surface reactions for obtaining low defect density amorphous silicon at high growth rates

5. High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition

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