Author:
Ikezawa S.,Homyara H.,Kubota T.,Suzuki R.,Koh S.,Mutuga F.,Yoshioka T.,Nishiwaki A.,Ninomiya Y.,Takahashi M.,Baba K.,Kida K.,Hara T.,Famakinwa T.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Proceedings of the 5th International Symposium on New Glass;Taoda,1995
2. Growth of microcrystalline silicon film by electron beam excited plasma chemical vapor deposition without hydrogen dilution
3. Report of the High-Tech Research Center of Chubu University;Ninomiya,1999
4. Technical Report of IEICE, ED99-28;Kubota,1999
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