Study of the growth mechanisms of chromium nitride films deposited by vacuum ARC evaporation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference35 articles.
1. The properties of TiN films deposited by filtered arc evaporation
2. Deposition temperature dependent characteristics of magnetron sputtered chromium nitride films
3. Properties of Crn and (Ti, Al)N Coatings Produced by High Rate Sputter Deposition
4. Physical vapor deposition of chromium and titanium nitrides by the hollow cathode discharge process
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