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Recrystallization and diffusion in sodium-implanted silicon

  • Published:1997-02 Issue:1-2 Volume:295 Page:169-177
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Wang W.H.,Bolse W.,Illgner C.,Lieb K.P.,Keinonen J.,Ewert J.C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-temperature diffusion of implanted sodium in silicon;Technical Physics Letters;2016-04

2. Electrically active sodium-related defect centres in silicon;Semiconductor Science and Technology;2013-08-16

3. Characterization of silicon doped with sodium upon high-voltage implantation;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2009-04

4. Redistribution of Implanted Species in Polycrystalline Silicon Films on Silicon Substrate;Defect and Diffusion Forum;2007-04

5. Network modification and epitaxial recrystallisation of ion-implanted α-quartz;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1999-01
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