Titanium carbide film deposition by DC magnetron reactive sputtering using a solid carbon source-Reference-Cited by-同舟云学术

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Titanium carbide film deposition by DC magnetron reactive sputtering using a solid carbon source

Published:1999-04 Issue: Volume:343-344 Page:254-256
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kusano E.,Satoh A.,Kitagawa M.,Nanto H.,Kinbara A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Carbide, Nitride and Boride Materials Synthesis and Processing,1997

2. Nature and Properties of Refractory Carbides;Upadhyaya,1996

3. Carbide, Nitride and Boride Materials Synthesis and Processing;Besmann,1997

4. Carbide, Nitride and Boride Materials Synthesis and Processing;Droes,1997

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