Influence of the substrate temperature on the structure and the optical properties of amorphous Si:H thin films prepared by reactive evaporation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Reversible conductivity changes in discharge‐produced amorphous Si
2. Densification of amorphous silicon prepared by hydrogen‐ion‐beam‐assisted evaporation
3. Influence of argon and hydrogen ions energy on the structure of a-Si:H prepared by ion-beam-assisted evaporation
4. Improvement of the stability under illumination of a-Si:H films elaborated by ion-beam-assisted evaporation using a hydrogen–argon plasma
5. Infrared Spectrum and Structure of Hydrogenated Amorphous Silicon
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1. Effects of catalyst-generated atomic hydrogen treatment on amorphous silicon fabricated by Liquid-Si printing;Japanese Journal of Applied Physics;2014-04-22
2. Effects of aluminium doping on zinc oxide transparent thin films grown by filtered vacuum arc deposition;Materials Science and Engineering: B;2012-06
3. Deposition temperature effects on the characteristics of a-Si:H deposited by pulsed DC magnetron sputtering;physica status solidi (a);2009-05-11
4. Hydrogenated amorphous silicon deposited by pulsed DC magnetron sputtering. Deposition temperature effect;Thin Solid Films;2008-11
5. Light-induced anelastic change in a-Si(H);Materials Science and Engineering: A;2006-12
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