High-temperature simultaneous removal of acetaldehyde and ammonia gases using corona discharge-Reference-Cited by-同舟云学术

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High-temperature simultaneous removal of acetaldehyde and ammonia gases using corona discharge

Published:2005-01 Issue:3-4 Volume:6 Page:319-324
ISSN:1468-6996
Container-title:Science and Technology of Advanced Materials
language:en
Short-container-title:Science and Technology of Advanced Materials

Author:

Chaichanawong Jintawat¹,Tanthapanichakoon Wiwut²,Charinpanitkul Tawatchai¹,Eiad-ua Apiluck¹,Sano Noriaki³,Tamon Hajime⁴

Affiliation:

1. Department of Chemical Engineering, Chulalongkorn University, Payathai Road, Pathumwan, Bangkok, 10330, Thailand

2. National Nanotechnology Center, Thailand Science Park, 111 Paholyothin Road, Klong Luang, Pathumthani, 12120, Japan

3. Department of Mechanical and System Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo, 671-2201, Japan

4. Department of Chemical Engineering, Kyoto University, Katsura, Nishikyo-ku, Kyoto, 615-8510, Japan

Publisher

Informa UK Limited

Subject

General Materials Science

Link

https://www.tandfonline.com/doi/pdf/10.1016/j.stam.2005.02.010

Reference25 articles.

1. H. Tamon, H. Mizota, N. Sano, S. Schulze, M. Okazaki, New concept of gas purification by electron attachment, AIChE J. 41 (1995) 1701–1711.

2. N. Sano, T. Nagamoto, H. Tamon, M. Okazaki, Removal of iodine and methyl iodide in gas by wetted-wall reactor based on selective electron attachment, J. Chem. Eng. Japan 29 (1996) 59–64.

3. N. Sano, Development of gas purification technology by selective electron attachment, Ph.D. Dissertation, Kyoto University, 1997.

4. N. Sano, T. Nagamoto, H. Tamon, T. Suzuki, M. Okazaki, Removal of acetaldehyde and skatole in gas by corona-discharge, Ind. Eng. Chem. Res. 36 (1997) 3783–3791.

5. N. Sano, H. Tamon, M. Okazaki, Removal of the chlorofluorocarbon 1,1,2-trichloro-1,2,2-trifluoroethane in gas by a corona-discharge reactor, Ind. Eng. Chem. Res. 37 (1998) 1428–1434.

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