Mass spectrometric study of low-pressure inductively coupled plasma for chemical vapor deposition of cubic boron nitride films
Author:
Affiliation:
1. Department of Materials Engineering, School of Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo-ku, Tokyo, 113-8656, Japan
Publisher
Informa UK Limited
Subject
General Materials Science
Link
https://www.tandfonline.com/doi/pdf/10.1016/j.stam.2003.10.029
Reference14 articles.
1. Vapour phase deposition of cubic boron nitride
2. High-Rate Deposition of High-Quality, Thick Cubic Boron Nitride Films by Bias-Assisted DC Jet Plasma Chemical Vapor Deposition
3. Cubic boron nitride thin film heteroepitaxy
4. Epitaxy of cubic boron nitride on (001)-oriented diamond
5. Direct growth of c-BN on a mono-structured transition layer by plasma-enhanced chemical vapor deposition
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