Halogen etching of Si via atomic-scale processes
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference90 articles.
1. J. Schultz, in: S.M. Sze (Ed.), VLSI Technology, McGraw-Hill, New York, 1988
2. Surface science aspects of etching reactions
3. Reaction mechanisms for the photon-enhanced etching of semiconductors: An investigation of the UV-stimulated interaction of chlorine with Si(100)
4. Semiconductor surface etching by halogens: Fundamental steps
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