Enhancement of microelectronic device performances by photothermal annealing under SiCl4 ambient
Author:
Publisher
Elsevier BV
Subject
Biomaterials,Bioengineering,Mechanics of Materials
Reference5 articles.
1. Oxide growth retardation induced by rapid thermal annealing in Czochralsky-grown silicon consequence on the efficiency and the stability of internal gettering of Cr
2. Phosphorous-diffusion gettering in the presence of a nonequilibrium concentrationof silicon interstitials: A quantitative model
3. Gettering of impurities in solar silicon
4. Silicon gettering: Some novel strategies for performance improvements of silicon solar cells
5. Performance improvements of crystalline silicon by iterative gettering process for short duration and with the use of porous silicon as sacrificial layer
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The removal of metal impurities from the surface of Czochralski wafers using a porous silicon-based gettering under a gas flow HCl/O 2 dry;Materials Research Bulletin;2017-07
2. Mechanical grooving effect on the gettering efficiency of crystalline silicon based solar cells;Journal of Crystal Growth;2017-04
3. The impact of thermal treatment on gettering efficiency in silicon solar cell;Materials Science in Semiconductor Processing;2015-02
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