Growth of nitrogen stabilised cubic ZrO2 phase by reactive magnetron sputtering using two reactive gases
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference8 articles.
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3. e−‐beam deposition of In2O3 stabilized ZrO2 films
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1. Increase of the deposition rate in reactive sputtering of metal oxides using a ceramic nitride target;Journal of Applied Physics;2009-05
2. Magnetic Properties of β-MnO2 Thin Films Grown by Plasma-Assisted Molecular Beam Epitaxy;The Journal of Physical Chemistry C;2008-09-04
3. Influence of nitrogen flow rate on the physical properties of ZrOxN1−x coatings produced by magnetron sputtering;Vacuum;2008-08
4. Experiments and modeling of dual reactive magnetron sputtering using two reactive gases;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2008-07
5. Preparation of Zr1−x AlxO2 by annealing of ZrOx/Al thin films in the air atmosphere;Materials Science and Engineering: C;2006-07
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