Author:
Legrand J-C,Diamy A-M,Hrach R,Hrachová V,reactib
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference15 articles.
1. Oumghar, A., Legrand, J.-C., Diamy, A.-M., Turillon N. and Ben-Aim, R. I., Plasma Chem. Plasma Process., 1994, 14, 229.
2. Diamy, A.-M., Legrand, J.-C. and Hrachová, V., J. Phys. III Fr., 1995, 5, 435.
3. Legrand, J.-C., Diamy, A.-M., Hrach, R. and Hrachová, V., Proc.12th Intern. Symp. on Plasma Chemistry, Vol. II, Mineapolis, USA, 1995, 601.
4. Legrand, J.-C., Diamy, A.-M., Hrach, R. and Hrachová, V., Vacuum, 1997, 48, 671.
5. Morgan, W. L., Plasma Chem. Plasma Process., 1992, 12, 477.
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