Modifying the electrical characteristics of magnetron sputtering sources using hollow cathode structured targets
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference15 articles.
1. Planar magnetron sputtering
2. Optimized magnetic field shape for low pressure magnetron sputtering
3. Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization
4. Hollow‐cathode‐enhanced magnetron sputtering
5. 7th Joint Vacuum Conference of Hungary;Musil,1997
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