Electron beam lithography simulation for high resolution and high-density patterns
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference17 articles.
1. Characteristics for negative and positive tone resists with direct write electron beam and SCALPEL exposure systems
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3. SELID: a new 3D simulator for e-beam lithography
4. LITHOS: A fast electron beam lithography simulator
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