Utilizing hydrolysis resistance of compressed Li3PS4 films to eradicate surface hydroxyls and form conformal coatings through atomic layer deposition
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Published:2024-04
Issue:
Volume:486
Page:149877
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ISSN:1385-8947
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Container-title:Chemical Engineering Journal
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language:en
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Short-container-title:Chemical Engineering Journal
Author:
Qiao Ronghan,
Yu Hailong,
Ben Liubin,
Tian Mengyu,
Shen Xiaoyu,
Cen Guanjun,
Zhu Jing,
Wang Qiyu,
Zhao Wenwu,
Zhang Jianru,
Huang XuejieORCID
Cited by
1 articles.
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