Enhancement of photocatalytic-based processes by mono- and bimetallic (CuPd) rutile loaded nanoparticles for antibiotic resistance genes and facultative pathogenic bacteria removal-Reference-Cited by-同舟云学术

Enhancement of photocatalytic-based processes by mono- and bimetallic (CuPd) rutile loaded nanoparticles for antibiotic resistance genes and facultative pathogenic bacteria removal

Published:2023-04 Issue: Volume:462 Page:142243
ISSN:1385-8947
Container-title:Chemical Engineering Journal
language:en
Short-container-title:Chemical Engineering Journal

Author:

Gmurek Marta^ORCID,Alexander Johannes,Mazierski Paweł,Miodyńska Magdalena,Fronczak Maciej^ORCID,Klimczuk Tomasz,Zaleska-Medynska Adriana^ORCID,Horn Harald,Schwartz Thomas

Funder

Alexander von Humboldt-Stiftung

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,Environmental Chemistry,General Chemistry

Reference74 articles.

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2. Antibiotic residues in final effluents of European wastewater treatment plants and their impact on the aquatic environment;Rodriguez-Mozaz;Environ. Int.,2020

3. Advanced wastewater treatment with ozonation and granular activated carbon filtration: inactivation of antibiotic resistance targets in a long-term pilot study;Slipko;J. Hazard. Mater.,2022

4. Does light-based tertiary treatment prevent the spread of antibiotic resistance genes? Performance, regrowth and future direction;Gmurek;Sci. Total Environ.,2022

5. Reduction of antibiotic resistance determinants in urban wastewater by ozone: emphasis on the impact of wastewater matrix towards the inactivation kinetics, toxicity and bacterial regrowth;Iakovides;J. Hazard. Mater.,2021

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