Unprecedented sulfenic acid-dependent hydroxyl radical production and DNA damage by N-heterocyclic thiols and H2O2
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Published:2024-03
Issue:
Volume:483
Page:148731
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ISSN:1385-8947
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Container-title:Chemical Engineering Journal
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language:en
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Short-container-title:Chemical Engineering Journal
Author:
Mao LiORCID,
Liu Zhi-Sheng,
Huang Chun-Hua,
Tang Tian-Shu,
Zhang Hao-Zhe,
Chen Shi-Yu,
Zhu Ben-Zhan