Capacity allocation with lot splitting in photolithography area using hybrid genetic algorithm based on self-tuning strategy
Author:
Publisher
Elsevier BV
Subject
General Engineering,General Computer Science
Reference25 articles.
1. Cycle-time improvements for photolithography process in semiconductor manufacturing;Akcalt;IEEE Transactions on Semiconductor Manufacturing,2001
2. Use of genetic algorithms to solve production and operations management problems: A review;Aytug;International Journal of Production Research,2003
3. Lot splitting to minimize average flow-time in a two-machine flow-shop;Bukchin;IIE Transactions,2002
4. Re-entrant flow shop scheduling problem with time windows using hybrid genetic algorithm based on auto-tuning strategy;Chamnanlor;International Journal of Production Research,2014
5. Application of a genetic algorithm in solving the capacity allocation problem with machine dedication in the photolithography area;Chen;Journal of Manufacturing Systems,2016
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