Thin film studies of oxides by the organometallic-CVD technique-Reference-Cited by-同舟云学术

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Thin film studies of oxides by the organometallic-CVD technique

Published:1983-01 Issue:4 Volume:6 Page:371-391
ISSN:0146-3535
Container-title:Progress in Crystal Growth and Characterization
language:en
Short-container-title:Progress in Crystal Growth and Characterization

Author:

Prakash Hari

Publisher

Elsevier BV

Subject

General Engineering

Reference74 articles.

1. SINGLE‐CRYSTAL GALLIUM ARSENIDE ON INSULATING SUBSTRATES

2. Recollections and Reflections of MO-CVD;Manasevit;J. Cryst. Growth,1981

3. Heteroepitaxial Growth and Characterization of Compound Semiconductors for Electronic Devices;Wang,1978

4. The Formation of Inorganic Coatings in the Decomposition of Organometallic Compounds

5. Preparation and Properties of NEA Heteroepitaxial Semiconductor Thin Films;Wang;Proc. Intern. Vac. Congr. 7th,1977

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1. MOCVD Synthesis of Terbium Oxide Films and their Optical Properties;Chemical Vapor Deposition;2015-04-24

2. Physical properties of nanostructured Mn3O4 thin films synthesized by SILAR method at room temperature for antibacterial application;Journal of Molecular Structure;2014-06

3. On surface temperature measurements with thermographic phosphors: A review;Progress in Energy and Combustion Science;2013-02

4. Characterization of thin solid films of rare earth oxides formed by the metallo-organic chemical vapour deposition technique, for high temperature corrosion applications;Thin Solid Films;1995-06

5. Ellipsometric Analysis of Growth Process and Corrosion Resistance of Nb2 O 5 Films Formed by MOCVD;Journal of The Electrochemical Society;1994-06-01

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