Prediction of plasma etch process by using actinometry-based optical emission spectroscopy data and neural network
Author:
Publisher
Elsevier BV
Subject
Industrial and Manufacturing Engineering,Metals and Alloys,Computer Science Applications,Modelling and Simulation,Ceramics and Composites
Reference17 articles.
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5. Prediction of plasma processes using neural network and genetic algorithm;Kim;Solid-State Electron.,2005
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