Solid phase epitaxy of a ternary system-Reference-Cited by-同舟云学术

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Solid phase epitaxy of a ternary system

Published:1998-11 Issue:1 Volume:418 Page:314-319
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Schmidt C.M.,Schaller D.M.,Meisinger F.,Bürgler D.E.,Güntherodt H.-J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference23 articles.

1. K. Maex, M. van Rossum (Eds.), Properties of Metal Silicides, emis datareview series no. 14, 1995.

2. Growth and characterization of epitaxial Ni and Co silicides

3. Formation of Ultrathin Single-Crystal Silicide Films on Si: Surface and Interfacial Stabilization of Si-NiSi2Epitaxial Structures

4. Surface Reconstruction and the Nucleation of Palladium Silicide on Si(111)

5. Structural and electronic properties of metastable epitaxialFeSi1+xfilms on Si(111)

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Magnetic phase diagram study of ultrathin Co/Si(111) films;Surface Science;2000-05

2. Atomic-scale scanning tunneling microscopy of amorphous surfaces;Physical Review B;1999-04-15

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