An efficient method for gradient-aware dummy fill synthesis

Author:

Wu Peng,Zhou Hai,Yan Changhao,Tao Jun,Zeng Xuan

Funder

National Natural Science Foundation of China (NSFC)

National Basic Research Program of China

National major Science and Technology

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Software

Reference19 articles.

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2. T. Park, T. Tugbawa, D. Boning, J. Chung, R. Muralidhar, S. Hymes, Y. Gotkis, S. Amalgir, R. Walesa, L. Shumway, G. Wu, F. Zhang, R. Kistler, J. Hawkins, Pattern and process dependencies in copper damascene chemical mechanical polishing processes, in: Proceedings of the VMIC, 1998, pp. 437–442.

3. Patterning-induced image placement distortions on electron beam projection lithography membrane masks;Lercel;Journal of Vacuum Science and Technology,2001

4. Mask distortion issues for next-generation lithography;Reu;Journal of Microelectronic Engineering,2003

5. N. Rodriguez, Using advanced planarity analysis to drive smarter filling strategies, EDA Tech Forum, DFM special edition.

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