Author:
Mendonça dos Santos P.,Mendes Luís,Vaz João Caldinhas
Funder
Fundação para a Ciência e a Tecnologia
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Software
Reference16 articles.
1. Improving the RF performance of 0.18μm CMOS with deep n-well implantation;Su;IEEE Electron. Dev. Lett.,2001
2. K. Chew, J. Zhang, K. Shao, W.B. Loh and S-.F. Chu, Impact of deep n-well implantation on substrate noise coupling and RF transistor performance for systems-on-a-chip integration, In: Proceedings of the 32th European Solid-State Device Research Conference, ESSDERC2002, Firenze, Italy, September 2002, pp. 251–254.
3. Substrate noise-coupling characterization and efficient suppression in CMOS technology;Yeh;IEEE Trans. Electron. Dev.,2004
4. Y. Ogasahara, M. Hashimoto, T. Kanamoto, T. Onoye, Measurement of supply noise suppression by substrate and deep n-well in 90nm process, In: Proceedings of the IEEE Asian Solid-State Circuits Conference, Fukuoka, Japan, November 2008, pp. 397–400.
5. Substrate noise coupling reduction in LC voltage-controlled oscillators;Wu;IEEE Electron. Dev. Lett.,2009
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