Thermomechanical properties of aluminum alkoxide (alucone) films created using molecular layer deposition-Reference-Cited by-同舟云学术

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Thermomechanical properties of aluminum alkoxide (alucone) films created using molecular layer deposition

Published:2009-10 Issue:17 Volume:57 Page:5083-5092
ISSN:1359-6454
Container-title:Acta Materialia
language:en
Short-container-title:Acta Materialia

Author:

Miller David C.,Foster Ross R.,Jen Shih-Hui,Bertrand Jacob A.,Seghete Dragos,Yoon Byunghoon,Lee Yung-Cheng,George Steven M.,Dunn Martin L.

Publisher

Elsevier BV

Subject

Metals and Alloys,Polymers and Plastics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference54 articles.

1. Atomic layer deposition (ALD): from precursors to thin film structures

2. Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

3. Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition

4. Advanced High K Dielectrics for Nano Electronics - Science and Technologies

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1. Interface engineering of lithium metal anodes via atomic and molecular layer deposition;Inorganic Chemistry Frontiers;2024

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3. Engineering Chemo-Mechanical Properties of Zn Surfaces via Alucone Coating;The Journal of Physical Chemistry C;2023-01-25

4. Synthesis of nanostructured materials via atomic and molecular layer deposition;Encyclopedia of Nanomaterials;2023

5. Elastic modulus of polyamide thin films formed by molecular layer deposition;Polymer;2022-08

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