Indentation response of a superlattice thin film revealed by in-situ scanning X-ray nanodiffraction
Author:
Funder
Austrian Science Fund
Publisher
Elsevier BV
Subject
Metals and Alloys,Polymers and Plastics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference42 articles.
1. The race to X-ray microbeam and nanobeam science;Ice;Science (80-.).,2011
2. Breaking the 10 nm barrier in hard-X-ray focusing;Mimura;Nat. Phys.,2010
3. Coherent X-ray diffraction imaging of strain at the nanoscale;Robinson;Nat. Mater.,2009
4. Nanoscale strain characterization in microelectronic materials using X-ray diffraction;Murray;Powder Diff.,2010
5. X-ray nanodiffraction on a single SiGe quantum dot inside a functioning field-effect transistor;Hrauda;Nanoletters,2011
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. In situ characterization of stresses, deformation and fracture of thin films using transmission X-ray nanodiffraction microscopy. Corrigendum;Journal of Synchrotron Radiation;2024-08-06
2. In situ characterization of stresses, deformation and fracture of thin films using transmission X-ray nanodiffraction microscopy;Journal of Synchrotron Radiation;2024-01-01
3. Evolution of residual stress and interface coherency and their impact on deformation mechanisms in Al/Ti multilayers;Journal of Materials Science;2023-09-11
4. Interface-Driven Strain in Heavy Ion-Irradiated Zr/Nb Nanoscale Metallic Multilayers: Validation of Distortion Modeling via Local Strain Mapping;ACS Applied Materials & Interfaces;2022-03-02
5. In Situ Coupling Applied Voltage and Synchrotron Radiation: Operando Characterization of Transistors;Nanoscale Research Letters;2022-02-02
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3